Lam Research’s selective etch portfolio provides a powerful advantage in the design and manufacture of advanced logic and memory semiconductor solutions. Prevos™ and Selis® (pictured) can be delivered ...

Over the past decade, the need for increasingly smaller, denser, more powerful chips has been driving semiconductor manufacturers to move away from planar structures in favor of increasingly complex ...

Minneapolis, Minn.-based semiconductor manufacturing surface conditioning equipment technology supplier FSI International Inc. is detailing its selective nitride etch processes, aimed at suppressing ...

Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif., ...

Nanoplas has announced a new dry-etch process offering virtually unlimited etch selectivity for removing dielectric films on microprocessors and memories at high throughput. Nanoplas’s new ...

After nearly a decade and five major nodes, along with a slew of half-nodes, the semiconductor manufacturing industry will begin transitioning from finFETs to gate-all-around stacked nanosheet ...

Fabrication of 3D NAND devices involves a challenging and complex deposition and etch process. Two etch processes have been identified as substantially impacting 3D NAND product yields: silicon ...

Anisotropic etching exploits the crystallographic orientation of silicon, utilising differential etch rates along distinct planes to produce highly defined microstructures. Central to this technique ...

FREMONT, Calif., Feb. 09, 2022 (GLOBE NEWSWIRE) — Lam Research Corp. (NASDAQ: LRCX) today announced a new suite of selective etch products that apply breakthrough wafer fabrication techniques and ...

New Portfolio Leapfrogs the Competition with Innovative Etch Techniques and Chemistries to Support Development of Advanced Logic and Memory Solutions FREMONT, Calif., Feb. 09, 2022 (GLOBE NEWSWIRE) -- ...